Particle Size Distribution and 99.9% Purity of Silicon Powder for Rotary Sputtering Targets

High-purity silicon powder is an important raw material for silicon-based sputtering targets and advanced functional materials. With the development of thin-film coating technologies, manufacturers require silicon powder with stable chemical composition, controlled impurities, and suitable particle size distribution.

Silicon Metal Powder with 99.9% Si content and a nominal particle size of 325 mesh is suitable for evaluating in specialized applications, including certain rotary sputtering target manufacturing processes.

Chemical Purity and Impurity Control

The Importance of 99.9% Silicon Content

A silicon purity of 99.9% indicates that silicon accounts for approximately 99.9% of the material by mass. The remaining content consists of impurities and other detectable components.

For high-purity silicon powder, important impurity elements include:

• Fe (Ferro)

• Al (Aluminum)

• Ca (Calcium)

• Cu (Copper)

• O (Oxygen)

Controlling these elements helps maintain chemical consistency and meet the requirements of different advanced material applications.

Oxygen Content and Material Stability

Oxygen content is an important quality indicator for fine silicon powder. Smaller particles have a larger specific surface area and may be more susceptible to surface oxidation.

Proper grinding, handling, and moisture-resistant packaging help maintain product quality during storage and transportation.

Particle Size Distribution of 325 Mesh Silicon Powder

Understanding 325 Mesh

325 mesh generally corresponds to a sieve aperture of approximately 45 microns (μm). It is commonly used to describe fine powder specifications.

However, mesh size alone cannot fully describe particle size distribution. Actual particle characteristics should also be evaluated according to customer requirements.

D10, D50 and D90 Analysis

Particle size distribution is commonly measured through three parameters:

• D10: 10% of particles are smaller than this size.

• D50: The median particle size.

• D90: 90% of particles are smaller than this size.

These measurements help evaluate powder uniformity, flowability, and suitability for specific processing technologies.

Applications in Rotary Sputtering Target Manufacturing

Silicon Powder for Plasma Spraying

High-purity silicon powder can serve as a feedstock for certain rotary silicon sputtering target manufacturing processes, including suitable plasma spraying applications.

Particle size, morphology, and flowability influence powder feeding and deposition performance. The final coating quality also depends on spraying parameters and substrate preparation.

Applications in Thin-Film Technologies

Silicon-based sputtering targets are used in various industrial coating applications, including:

• Architectural and functional glass coatings

• Photovoltaic glass

• Optical coatings

• lectronic materials

• Advanced thin-film technologies

The final film properties depend on target composition and deposition conditions.

Quality Control and Product Selection

Selecting suitable silicon powder requires comprehensive evaluation rather than focusing only on purity and mesh size.

Important quality indicators include:

• Silicon content: 99.9%

• Nominal particle size: 325 mesh

• Chemical impurities: Fe, Al, Ca, Cu, etc.

• Oxygen content

• Particle size distribution: D10, D50, D90

• Moisture and packaging conditions

Different target manufacturing processes may require different specifications. Technical requirements should therefore be confirmed with the end user.

Hongshun —— High-Purity Silicon Powder Manufacturer and Supplier in China

With more than 30 years of experience in ferroalloy manufacturing, Hongshun supplies industrial silicon materials and customized alloy products to international markets.

Our in-house laboratory supports chemical composition analysis and particle size inspection to help maintain consistent product quality.

Hongshun focuses on:

• Chemical composition and impurity control

• Particle size classification and screening

• Batch quality inspection

• Customized specifications and packaging

• Professional export and shipment services

Our 99.9% high-purity Silicon Metal Powder with a nominal particle size of 325 mesh is available for customers evaluating raw materials for rotary sputtering targets and other specialized silicon material applications.

Chemical purity, particle size distribution, and oxygen content are essential factors in evaluating high-purity silicon powder.

For rotary sputtering target manufacturers, consistent raw material quality and suitable particle characteristics contribute to reliable downstream processing.

Hongshun is committed to providing stable-quality silicon powder and customized material solutions for global industrial customers.